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Plasma Cleaning

The decontamination process, validated and implemented over the years, has been renewed by GiEsse Technology thanks to the collaboration with the University of Trieste.

In fact, a new CLEANING WITH PLASMA REACTOR process has been introduced. This, carried out at the end of the classic ultrasonic washes, allows an increase in the decontamination of the implant surface, reducing the risk of peri-implantitis and favoring the osseointegration process.

The implants to be treated are placed in a reactor where they are exposed to the flow of an high-power plasma inert gas (Argon). Thanks to the kinetic impact energy of the ions, atoms and molecules of contaminants and organic components present on the surface of the implant are expelled and then removed thanks to the vacuum pump.

Compared to traditional cleaning treatments, plasma decontamination does not require the use of cleaning liquids that could leave residues or impurities that could alter the osseointegration process; moreover, the flow of plasma is able to penetrate into slots or areas (e.g. etching slots) which are difficult to reach by traditional cleaning liquids.

The tests of cellular contamination and proliferation conducted in collaboration with the University of Trieste have highlighted the excellent level of cleanliness of the surface and the reduced presence of pro-inflammatory contaminats obtained thanks to the adoption of this new decontamination technology. Furthermore, the surfaces treated with plasmahave a high wettability and are more prone to promote cell adhesion.

The reproducibilty of the treatment and the considerable possibility to control the process variables make it possible to exploit this type of treatment even with products of complex geometry, offering a very high consistency in therm of quality.